Accession Number:

ADA499493

Title:

Innovative Technologies for Maskless Lithography and Non-Conventional Patterning

Descriptive Note:

Final rept. 1 Jul 2004-31 Dec 2007

Corporate Author:

CALIFORNIA UNIV BERKELEY SPONSORED PROJECTS OFFICE

Report Date:

2008-08-01

Pagination or Media Count:

21.0

Abstract:

Collaborative research was conducted by the faculty known as the Lithography Network. This network brings together world class researchers over a broad set of technology areas essential to the success of maskless lithography and non-conventional patterning. The primary faculty by task is listed below Task 1 Electron Beam Technology for Maskless Lithography, Professor R. Fabian Pease Coordinator Task 2 Spatial Light Modulators for Maskless lithography, Professor Olav Solgaard Coordinator Professor Andrew Neureuther Task 3 Maskless Droplet-On-Demand DoD Systems. Professor Vivek Subramanian Coordinator, Professor Jeffrey Bokhor Task 4 Advanced Materials for Maskless Lithography, Professor C. Grant Willson Coordinator, Professor Jean Frechet Task 5 Characterization of Nanoscale Phenomena for Maskless Lithography, Professor Andrew R. Neureuther Coordinator Task 6 Data Compression and Path Issues for Maskless Lithography, Professor Avideh Zakhor Coordinator.

Subject Categories:

  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE