Hydrogen Termination Following Cu Deposition on Si(001)
NAVAL RESEARCH LAB WASHINGTON DC
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We describe the surface structures following submonolayer Cu deposition on Si001 and subsequent hydrogen termination as characterized by scanning tunneling microscopy. Cu adsorption at 870 K results in a characteristic 28 islandvacancy structure, as previously reported. In addition, occasional structures are observed attributed to Cu in surface interstitial sites. After H termination, the dominant features of the islandvacancy structure remain, but the size and distribution of the structures are significantly altered. Based on the atomic-scale appearance of both the clean and H-terminated structures, we propose that within the 28 islandvacancy structure all surface atoms are Si, with all Cu subsurface, contrary to previous structural models.
- Inorganic Chemistry
- Solid State Physics