Accession Number:

ADA482514

Title:

Hydrogen Termination Following Cu Deposition on Si(001)

Descriptive Note:

Journal article

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Report Date:

2005-04-08

Pagination or Media Count:

5.0

Abstract:

We describe the surface structures following submonolayer Cu deposition on Si001 and subsequent hydrogen termination as characterized by scanning tunneling microscopy. Cu adsorption at 870 K results in a characteristic 28 islandvacancy structure, as previously reported. In addition, occasional structures are observed attributed to Cu in surface interstitial sites. After H termination, the dominant features of the islandvacancy structure remain, but the size and distribution of the structures are significantly altered. Based on the atomic-scale appearance of both the clean and H-terminated structures, we propose that within the 28 islandvacancy structure all surface atoms are Si, with all Cu subsurface, contrary to previous structural models.

Subject Categories:

  • Inorganic Chemistry
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE