Accession Number:

ADA470721

Title:

Maskless Lithography Using Surface Plasmon Enhanced Illumination

Descriptive Note:

Final rept. 1 Jul 2004-31 Jan 2007

Corporate Author:

HARVARD COLL CAMBRIDGE MA PRESIDENT AND FELLOWS

Personal Author(s):

Report Date:

2007-04-30

Pagination or Media Count:

4.0

Abstract:

The ability of surface plasmon enhanced illumination SPEI devices to use visible wavelengths to expose photoresist with subwavelength features has been demonstrated and a manuscript is being prepared for submission to PNAS. The SPEI devices consist of a regular array of nanometric features in a metaldielectric laminate device that transmit light via extraordinary optical transmission EOT with a semicollimated beam of light. This beam of light is scanned across a photoresist coated wafer to expose the photoresist and create the desired pattern. In this project SPEI devices and probes were created, a nanoscale scanner was designed and fabricated, and photoresist was developed to determine the geometric properties of the beam of light emitted from these SPEI devices, and a system throughput study was prepared to assess the throughput of a SPEI system when incorporated into a stepper system. The fundamental feasibility of this approach has been demonstrated. Harvards licensing office is currently in discussions with Zeiss to commercialize this technology for the semiconductor industry.

Subject Categories:

  • Electrical and Electronic Equipment
  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE