Accession Number:

ADA467033

Title:

Infrared and Electrical Properties of Amorphous Sputtered (LaxA1l-x)2O3 films

Descriptive Note:

Journal article

Corporate Author:

AIR FORCE RESEARCH LAB KIRTLAND AFB NM SPACE VEHICLES DIRECTORATE

Personal Author(s):

Report Date:

2003-01-01

Pagination or Media Count:

6.0

Abstract:

Amorphous LaxAlsub 1-xsub 2O3 0.61 less than or equal to x less than or equal 0.73 films have been deposited by sputtering in a partially reactive atmosphere. The average dielectric constant of the as-deposited films was 13.4 and 12.5 following annealing at 700 C for 60 min in N2 both values were much lower than the single crystal values 24 and 28 for LaA1O3 and La2O3, respectively. Leakage current densities were 10-8 A sq cm for an applied field of 1 MV cm for film thicknesses 75 nm. Fourier transform infrared spectroscopy reveals transverse optic mode peaks at 723 and 400 cm and corresponding longitudinal optic modes at 821 and 509 cm. The density of the amorphous phase is estimated to be 0.9 times

Subject Categories:

  • Miscellaneous Materials
  • Electricity and Magnetism

Distribution Statement:

APPROVED FOR PUBLIC RELEASE