Accession Number:

ADA465829

Title:

Measurements and Modeling of SiCl(4) Combustion in a Low-Pressure H2/O2 Flame

Descriptive Note:

Corporate Author:

AEROSPACE CORP EL SEGUNDO CA LAB OPERATIONS

Personal Author(s):

Report Date:

2006-11-10

Pagination or Media Count:

28.0

Abstract:

Laser-Induced Fluorescence LIF was used to measure temperature and OH concentration profiles as a function of distance from a McKenna-style burner in premixed, one-dimensional, low-pressure H2O2Ar SiCl4-doped flames. The addition of SiCl4 was shown to affect the flame temperature and OH concentration profiles. A gas-phase chemical kinetics mechanism for the combustion of SiCl in an H2O2Ar flame was proposed, and experimental results were compared with predictions for a premixed, one-dimensional laminar flame model based on CHEMKIN. The low-pressure flame data are sensitive to the overall kinetics of the mechanism. In order to obtain the best fit to the observed data for all flame configurations, we had to modify six different rates from our original estimates. None of the modified rates are well known for the temperature regime of our flame. Particle formation and surface chemistry were not taken into account.

Subject Categories:

  • Inorganic Chemistry
  • Radiation and Nuclear Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE