Accession Number:

ADA465823

Title:

Research on Nitride Thin Films, Advanced Plasma Diagnostics, and Charged-Particle Processes

Descriptive Note:

Final rept. 21 Jul 2000-01 Jun 2006

Corporate Author:

INNOVATIVE SCIENTIFIC SOLUTIONS INC DAYTON OH

Report Date:

2006-07-01

Pagination or Media Count:

130.0

Abstract:

This program has three sub-tasks 1 Nitride Thin-Film Coatings, 2 Advanced Plasma Diagnostics, and 3 Studies of Charged-Particle Processes. The focus of Task 1 has been to develop amorphous carbon-nitride films utilizing controlled plasma-generated ions to increase the nitrogen concentration within the film. It is anticipated that development of films with higher concentrations of nitrogen will lead to properties similar to those theoretically calculated for crystalline 946-C3N4. Successful development of this film will facilitate the creation of a smooth, extremely hard, thermally stable amorphous film. Applications can include hard-coating protection, solid lubricants, reduced friction and wear coatings, thermal heat spreaders, and high-temperature dielectrics. In Task 2 advanced diagnostics of plasmas with various operating conditions have been performed to gain a better understanding of the generated plasma fields. Task 3 has utilized Fourier Transform Mass Spectrometry FTMS to investigate gas-phase reactions of charged particles. Ion chemistries have been studied in selected compounds of great interest in areas including plasma processing and combustion. Cross sections of electron-impact ionization of these compounds have been measured and the kinetics of the reactions between the ions and their parent molecules examined.

Subject Categories:

  • Inorganic Chemistry
  • Atomic and Molecular Physics and Spectroscopy
  • Plasma Physics and Magnetohydrodynamics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE