Accession Number:

ADA465454

Title:

In Situ Analysis of the Tribochemical Films Formed by SiC Sliding Against Mo in Partial Pressures of SO2, O2, and H2S Gases

Descriptive Note:

Journal article

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Report Date:

1996-02-01

Pagination or Media Count:

9.0

Abstract:

X-ray photoelectron spectroscopy XPS and Auger electron spectroscopy AES were used to identify gas reaction layers and tribochemical films formed during reciprocating sliding tests in an ultrahigh vacuum UHV tribometer. Tests were performed on UHV cleaned SiC pins and Mo flats during or after exposure to SO2, O2, or H2S gas at pressures around 40 Pa. XPS identified the gas reaction layers on Mo to be chemisorbed MoS2 andor MoO2 phases less than 1 nm thick. AES of Mo wear tracks showed tribochemical films similar in composition to, but thicker than, the reaction layers. AES of SiC wear scars in all three gases indicated tribochemical films containing Si oxide andor Si sulfide and possibly graphite. In addition, transfer films of Mo oxysulfide and Mo oxide were found in SO2 and O2 tests, respectively, but no transfer films were detected in H2S tests. Thermochemical calculations of stable reaction products of the gas solid reactions were in good agreement with the phases inferred from XPS and AES. An explanation for the agreement between thermochemical predictions and tribochemical results is given.

Subject Categories:

  • Physical Chemistry
  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE