Microstructure Technology for Fabrication of Metal-Mesh Grids
SMITHSONIAN INSTITUTION WASHINGTON DC
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Motivated by the need for highly efficient far-IR Fabry-Perot etalons for airborne and space astronomy, we have developed a high-yield photolithographic technique for producing low-loss metal-mesh reflectors. We describe the production technique and report on the mesh flatness and uniformity. Optical measurements of meshes produced by this technique show that absorptivity of less than 1 with reflectivity of more than 98 was achieved at the longest wavelengths measured, which proved them to be significantly more efficient than commercially available meshes. This process can achieve wire widths that are less than the mesh thicknesses typically 3 micrometers, which extends their applicability to wavelengths as short as 20 micrometers without sacrificing mechanical strength for airborne and space-flight applications. Key words Fabry-Perot, far-infrared, metal mesh, microstructure technology.
- Cartography and Aerial Photography
- Radiofrequency Wave Propagation