Neutral Atom Lithography With Multi-Frequency Laser Fields
Final rept. 15 Jun 2003-14 Jun 2006
PURDUE UNIV LAFAYETTE IN
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In this final report we describe our efforts in exposing self-assembled molecular monolayers to a beam of neutral sodium atoms and chemically etching the resulting substrate and characterization of the resulting surface. We also discuss our development of a rubidium magneto-optical trap.
- Physical Chemistry
- Atomic and Molecular Physics and Spectroscopy