Accession Number:

ADA458179

Title:

Polyhedral Oligomeric Silsesquioxane (POSS) Polyimides as Space-Survivable Materials

Descriptive Note:

Conference paper

Corporate Author:

AIR FORCE RESEARCH LAB EDWARDS AFB CA PROPULSION DIRECTORATE

Report Date:

2006-01-01

Pagination or Media Count:

13.0

Abstract:

Polyimides PIs such as Kapton are used extensively in spacecraft thermal blankets, solar arrays, and space inflatable structures. Atomic oxygen AO in low Earth orbit LEO causes severe degradation of Kapton. SiO2 coatings impart remarkable oxidation resistance and have been widely used to protect Kapton, yet imperfections in the SiO2 application process and micro-meteoroiddebris impact in orbit damage the SiO2 coating leading to Kapton erosion. A polyimide that is self-passivating by the formation of a silica layer upon exposure to AO has been achieved by the copolymerization of a polyhedral oligomeric silsesquioxane POSS diamine. The self-passivating properties have been shown by monitoring a 1 micron deep scratch in POSS-PIs after exposure to AO. During the first AO exposure and outside of the scratch, these samples eroded 5.0 microns, 0 microns, and less than 200 nm respectively. During the second AO exposure, the samples eroded an additional 5.0 microns within the scratch and outside of the scratch, 7.0 microns within the scratch and 0 microns outside of the scratch, and 200 nm within the scratch and 0 microns outside of the scratch respectively.

Subject Categories:

  • Polymer Chemistry
  • Plastics
  • Unmanned Spacecraft

Distribution Statement:

APPROVED FOR PUBLIC RELEASE