Accession Number:

ADA440254

Title:

Metal Organic Chemical Vapor Deposition of Oxide Films for Advanced Applications

Descriptive Note:

Conference paper

Corporate Author:

STRUCTURED MATERIALS INDUSTRIES INC PISCATAWAY NJ

Report Date:

2000-06-01

Pagination or Media Count:

13.0

Abstract:

Transparent and conductive films, well known for their historical roles in solar cells and displays, are receiving renewed attention due to the need for increased performance requirements and for advanced applications that are being developed. While there are many methods to deposit thin films, Metal Organic Chemical Vapor Deposition MOCVD is of particular importance for producing high quality films over large areas in a manufacturing mode. Important features of MOCVD include excellent conformality of deposited films, elimination of pinhole type defects, the absence of radiation process induced damage, and low particle counts. Over the past several years, we have devoted our efforts to developing and advancing the MOCVD process and systems technology, primarily using Rotating Disk Reactors RDRs, and advancing the breadth of deposited oxide materials for several applications. The deposition technology, which will be reviewed, has been scaled from a 5 deposition diameter through to 12 diameter. We have found that MOCVD has been able to produce a wide range of oxide materials under a variety of processing conditions and that the technology is readily scalable. Systems technology, processing parameters and results for MOCVD of transparent visible and IR and conductive oxides will be reviewed. Advanced materials development and applications such as production of luminescent or p-type ZnO and related oxides, development of amorphous, polycrystalline and single crystal films and applicability in photovoltaics, LEDs or lasers, detectors, and others will also be addressed.

Subject Categories:

  • Industrial Chemistry and Chemical Processing
  • Inorganic Chemistry
  • Electrooptical and Optoelectronic Devices

Distribution Statement:

APPROVED FOR PUBLIC RELEASE