Accession Number:

ADA415898

Title:

Reaction Ion Etcher for MEMS Fabrication

Descriptive Note:

Final rept. 2001-2002

Corporate Author:

FLORIDA INTERNATIONAL UNIV MIAMI

Personal Author(s):

Report Date:

2003-04-11

Pagination or Media Count:

3.0

Abstract:

This grant was for the purchase and installation of a Reaction Ion Etcher. The grant had a value of 100,000 and 93,600 was used to purchase a Model CS1701 Reaction Ion Etcher, single chamber system with capabilities for four reaction gases. Additionally, approximately 2,400 was spent on the purchase of regulators, gases, and other hardware necessary to make the RIE operational. A small amount of money was used to pay summer support for a graduate student to install and baseline the operation of the RIE. The RIE is fully functional and is a key piece of instrumentation the developing nanomicro electro mechanical systems laboratory, which has recently been augmented by the donation from Motorola, Plantation, FL, of their complete MEMS facility, including an additional March RIE with metal etch capabilities, an OAT micro aligner, a class 100 clean room, an e-beam nanolithography system, and all other support equipment necessary to fabricate NMEMS.

Subject Categories:

  • Electrical and Electronic Equipment
  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE