Reaction Ion Etcher for MEMS Fabrication
Final rept. 2001-2002
FLORIDA INTERNATIONAL UNIV MIAMI
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This grant was for the purchase and installation of a Reaction Ion Etcher. The grant had a value of 100,000 and 93,600 was used to purchase a Model CS1701 Reaction Ion Etcher, single chamber system with capabilities for four reaction gases. Additionally, approximately 2,400 was spent on the purchase of regulators, gases, and other hardware necessary to make the RIE operational. A small amount of money was used to pay summer support for a graduate student to install and baseline the operation of the RIE. The RIE is fully functional and is a key piece of instrumentation the developing nanomicro electro mechanical systems laboratory, which has recently been augmented by the donation from Motorola, Plantation, FL, of their complete MEMS facility, including an additional March RIE with metal etch capabilities, an OAT micro aligner, a class 100 clean room, an e-beam nanolithography system, and all other support equipment necessary to fabricate NMEMS.
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