Instrumentation to Facilitate High Protection Materials Synthesis and Analysis with an Existing Ti-Sapphire Femtosecond Laser
Final rept. 1 Mar 2001-31 May 2002
STATE UNIV OF NEW YORK AT STONY BROOK DEPT OF MATERIALS SCIENCE AND ENGINEERING
Pagination or Media Count:
We have designed and built a high precision computer controlled materials synthesis and analysis vacuum apparatus which will enable state-of-the-art control for both micro-machining and inspection as well as thin film synthesis when interfaced to our Universitys Ti-sapphire femtosecond laser. The majority of the machining of this apparatus had to be performed at a company who has had difficulties with meeting schedules due to probable downsizing issues. This has left our project seriously behind schedule and thus only now could the final report be written and issued. The apparatus consists of a high precision gonimeter on which the laser target is held on to a motorized x-y stage. The target is able to rotate precisely to one of two quartz windows through which two ultra-high accuracy triangulating laser sensors are used to measure surface details to sub-micron precision regardless of the optical condition of the surface diffuse or specular. The ability to precisely raster the target during ablation has dual use. In the case of synthesizing thin films, the rastering prevents cone formation in the target and thus improves film quality. When ablation is used for removal of layer from a sample such as paint or conversion coating, in preparation of further surface analysis, the rastering facilitates making a suitable window through the layer. Additionally, duplex-layered electrodes may be formed by combining synthesis and micro-machining so as to expose both layers during electrochemical analysis. The apparatus has been designed by us to meet the need for such a system at reasonable cost and because no such system to our knowledge was available on the market.
- Laminates and Composite Materials
- Computer Systems
- Manufacturing and Industrial Engineering and Control of Production Systems