Approaches to Advanced Materials for Photorefractive Applications and Radiation Hardening
Final rept. 1 Dec 1998-30 Nov 2001
ARIZONA UNIV TUCSON DEPT OF CHEMISTRY
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We have made considerable advances in the development of optical-limiting systems based upon two-photon absorption processes. To accomplish this, it has been essential to develop an understanding of basic structure-property relationships for conjugated organic materials. To this end, we have investigated a range of phenylene-vinylene-based materials substituted with various combinations of donor and acceptor moieties. We now have a more thorough understanding of how to design materials with very high two-photon cross-sections in any part of the visible spectrum, opening the possibility for broad-band optical limiting based on a combination of these materials. We have used the dioxaborine moiety as an acceptor in a variety of conjugated systems and have found that in certain molecular architectures, this can lead to very high two-photon cross-sections. Some of the dioxaborine moieties also show very high electron mobilities, suggesting applications as charge carriers in photorefractive polymer composites. New carbazole-based materials have been designed and synthesized and are anticipated to be more photostable than related bisdiarylaminobiphenyls, whilst retaining the charge carrying and optical-limiting properties of the latter class of materials. Finally, the charge-transporting and optical-limiting bisdiarylaminobiphenyl group has been incorporated into new polymers, that can readily be cast into thermally stable films.
- Nuclear Radiation Shielding, Protection and Safety
- Atomic and Molecular Physics and Spectroscopy