Accession Number:

ADA399316

Title:

Ferroelectric Thin Films IX. Volume 655. Symposium Held in Boston, MA on November 26-30, 2000

Descriptive Note:

Corporate Author:

MATERIALS RESEARCH SOCIETY WARRENDALE PA

Personal Author(s):

• McIntyre, Paul C.
• Gilbert, Stephen R.
• Miyasaka, Yoichi
• Schwartz, Robert W.
• Wouters, Dirk

Report Date:

2001-01-01

Pagination or Media Count:

502.0

Abstract:

This symposium, Ferroelectric Thin Films IX, held November 26-30 at the 2000 MRS Fall Meeting in Boston, Massachusetts, was the ninth in a series of highly successful MRS symposia on this topic. Understanding ferroelectric thin films through use of novel and sophisticated characterization methods was an important theme in this edition of the symposium series. Both oral and poster presentations at the symposium described recent advances in scanning probe imaging methods and analysis techniques, electrical characterization methods, and x-ray and TEM-based probes of ferroelectric thin films. In addition, several presentations reviewed progress in the technology of ferroelectric thin films for use in semiconductor memories, piezoelectric devices, and other applications. The technical quality of the contributed presentations was evidenced by the awarding of Poster Awards by the 2000 Fall Meeting chairs to two posters in this symposium, a rare honor.

Descriptors:

• *THIN FILMS
• *FERROELECTRIC MATERIALS
• HIGH FREQUENCY
• SYMPOSIA
• TUNABLE LASERS
• SUPERLATTICES
• DIELECTRICS
• GATES(CIRCUITS)
• OPTICAL MATERIALS
• CHEMICAL VAPOR DEPOSITION
• EPITAXIAL GROWTH
• MICROWAVE EQUIPMENT
• SEMICONDUCTOR DEVICES
• MEMORY DEVICES
• ELECTROMECHANICAL DEVICES
• ELECTRODES
• PIEZOELECTRIC MATERIALS
• HIGH DENSITY
• INFRARED DETECTORS
• PYROELECTRICITY
• NONVOLATILE MEMORIES
• THERMOELECTRICITY
• BISMUTH COMPOUNDS
• THIN FILM CAPACITORS
• GASEOUS DIFFUSION SEPARATION
• NANOTECHNOLOGY
• BARIUM STRONTIUM TITANATES

Subject Categories:

• Electrical and Electronic Equipment
• Electricity and Magnetism
• Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE