DURIP: Request for Lithography and Metallization Equipment
Final rept. 3 Jan 98-28 Feb 99
VIRGINIA COMMONWEALTH UNIV RICHMOND SCHOOL OF ENGINEERING
Pagination or Media Count:
Electron beam lithography equipment, sputtering unit and missing components of an MOCVD system have been ordered. LEO-440 electron microscope was outfitted with Nabity Pattern Generation Systems software and associated hardware which allowed the microscope to be used in imaging and e-beam pattern generation modes. The instruments achieved 2 nm resolution in imaging mode and we are aiming at 50 nm in the writing mode. Necessary hardware components and operating software for a custom designed MOCVD system were ordered from EMCORE, received and integrated with the gas delivery system received from EMCORE and custom deposition reactor received from SVT Assoc. earlier. The system integration is nearly complete with some minor outstanding components from EMCORE. A sputtering system with one RF magnetron sputter gun and a pulsed magnetron sputter gun in an 18 chamber has been ordered from Kurt Lesker Company and is slated for delivery in a few months.
- Manufacturing and Industrial Engineering and Control of Production Systems
- Printing and Graphic Arts
- Electrical and Electronic Equipment