Accession Number:

ADA359222

Title:

Advanced Synthesis of Carbon Nitride

Descriptive Note:

Final rept. 6 Jan 97-30 Nov 98

Corporate Author:

ROCKWELL INTERNATIONAL CORP THOUSAND OAKS CA SCIENCE CENTER

Personal Author(s):

Report Date:

1998-12-01

Pagination or Media Count:

40.0

Abstract:

Thin films composed of carbon and nitrogen were generated on a variety of substrates by deposition of radicals obtained after dissociation of gaseous cyanogen azide or solid cyanuric triazide CTA. These intermediates were obtained upon reacting cyanogen halides or cyanuric chloride, respectively, with sodium azide. The CTA was chemically pure, whereas the gaseous azides were contaminated by halogens that were difficult to safely remove. Energy transfer from discharged nitrogen in a low-pressure flowtube reactor was used to dissociate cyanogen azide and ultraviolet photolysis was employed at ambient pressure to dissociate CTA. Films generated at low pressure demonstrated a bandgap of 2.6 eV with a 2.3 refractive index at visible wavelength. X-ray photoelectron spectroscopy showed the films to consist of near equal yields of diamond-like carbon and a phase with carbon nitride stoichiometry. Films from both donors demonstrated absorption bands in the infrared that peaked at 1600 and 3150 wave numbers. Film adhesion was best on silicon carbide and aluminum nitride, on substrates that were heated during deposition, and when made from CTA. Deposition onto silicon carbide or aluminum nitride at 360 deg C yielded crystalline films with x-ray diffraction peaks that precisely matched the known ultrahard beta-phase of carbon nitride.

Subject Categories:

  • Inorganic Chemistry
  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE