Accession Number:

ADA339946

Title:

A Technique to Ease the Fabrication Tolerance of Integrated Optical Power Splitters

Descriptive Note:

Final rept. Jan-Aug 96

Corporate Author:

ARMY RESEARCH LAB ADELPHI MD

Personal Author(s):

Report Date:

1998-02-01

Pagination or Media Count:

18.0

Abstract:

Fabrication tolerances and sidewall scattering losses in self imaging waveguide devices are ameliorated by a partial etch fabrication technique. Using a modal decomposition model, we find that the self imaging planes depth of focus increases with a reduction in etch depth. A broad depth of focus in the self image plane relaxes the fabrication tolerance of the devices critical width dimension for a specified device performance. Trade offs for this increased depth of focus include a modest increase in device length and a slight reduction in peak coupling efficiency.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE