A Technique to Ease the Fabrication Tolerance of Integrated Optical Power Splitters
Final rept. Jan-Aug 96
ARMY RESEARCH LAB ADELPHI MD
Pagination or Media Count:
Fabrication tolerances and sidewall scattering losses in self imaging waveguide devices are ameliorated by a partial etch fabrication technique. Using a modal decomposition model, we find that the self imaging planes depth of focus increases with a reduction in etch depth. A broad depth of focus in the self image plane relaxes the fabrication tolerance of the devices critical width dimension for a specified device performance. Trade offs for this increased depth of focus include a modest increase in device length and a slight reduction in peak coupling efficiency.
- Electrical and Electronic Equipment