Accession Number:

ADA339034

Title:

Laser Induced Chemical Vapor Deposition of Thin Films

Descriptive Note:

Final rept.

Corporate Author:

TECHNION - ISRAEL INST OF TECH HAIFA

Personal Author(s):

Report Date:

1995-01-01

Pagination or Media Count:

60.0

Abstract:

This report results from a contract tasking Technion as follows Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.

Subject Categories:

  • Organic Chemistry
  • Physical Chemistry
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE