Accession Number:

ADA334393

Title:

Microlithographic Mask Development (MMD)

Descriptive Note:

Corporate Author:

LOCKHEED MARTIN FEDERAL SYSTEMS MCLEAN VA

Personal Author(s):

Report Date:

1997-12-22

Pagination or Media Count:

142.0

Abstract:

The primary goal throughout the Option 2 contract period was to eliminate the gold absorber process and implement a refractory metal process. With the initial transition completed, in which all mask patterning processes have been implemented within the MMD, the focus is currently on implementing all substrate fabrication steps within the MMD as well. This has resulted in the purchase and installation of some major equipment. In addition, our goal of developing processes for 130nm and below continues, and has also resulted in major equipment purchases and process changes. At the same time, we have been working on several important product demonstration masks for various customers.

Subject Categories:

  • Inorganic Chemistry
  • Coatings, Colorants and Finishes

Distribution Statement:

APPROVED FOR PUBLIC RELEASE