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Electrochemical Atomic Layer Epitaxy
Technical rept. May 96-Sep 97
GEORGIA UNIV ATHENS DEPT OF CHEMISTRY
Pagination or Media Count:
This is a review of work performed in the P.I.s laboratory concerning development of the method of electrochemical atomic layer epitaxy. It includes an introduction covering compound semiconductor electrodeposition, with a table containing about 400 references. It contains a chapter on thin layer electrochemical studies, which are frequently used to get an initial idea of the conditions that should be used in an automated deposition cycle. There is a section on the development of the automated flow deposition system, and the growth of thin films of CdTe. There is a section on the atomic level characterization of these films using surface analytical methods. There is a section on the inverse of electrochemical ALE, digital etching. In those studies atomic layers are removed one at a time. There is also a conclusions section describing here we feel these techniques are going.
APPROVED FOR PUBLIC RELEASE