Accession Number:

ADA326535

Title:

Particulate Contaminant Formation and Transport in Microelectronic Manufacturing Processes. Phase II.

Descriptive Note:

Quarterly rept. no. 5,

Corporate Author:

CFD RESEARCH CORP HUNTSVILLE AL

Personal Author(s):

• Stout, Phillip J.
• Krishnan, Anantha
• Rao, N. P.
• Girshick, Steven L.
• Kushnet, Mark J.

Report Date:

1997-05-01

Pagination or Media Count:

11.0

Abstract:

This is the fifth quarterly report documenting the work performed during a two year Phase II STTR activity entitled Particulate contaminant formation and transport in microelectronic manufacturing processes. The overall objective is to produce a charging, transport, and growth simulation CTGS tool that can be used effectively by equipment manufacturers and users to reduce particle generation in fabrication systems.

Descriptors:

• *MICROELECTRONICS
• *CONTAMINANTS
• COMPUTERIZED SIMULATION
• IONS
• MODELS
• GROWTH(GENERAL)
• PLASMAS(PHYSICS)
• FABRICATION
• NUCLEATION
• CHARGED PARTICLES
• COMPUTATIONAL FLUID DYNAMICS
• REDUCTION
• SILANES
• TRANSPORT
• INSTRUMENTATION
• PARTICULATES
• SILICON COMPOUNDS
• DRAG
• ELECTROSTATICS

Subject Categories:

• Physical Chemistry
• Electrical and Electronic Equipment
• Fluid Mechanics
• Plasma Physics and Magnetohydrodynamics
• Computer Programming and Software

Distribution Statement:

APPROVED FOR PUBLIC RELEASE