In-Situ Growth Monitoring of Molecular Beam Epitaxy Processes.
Rept. for 1 Jul 92-31 Dec 95,
ARIZONA STATE UNIV TEMPE
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Work on this project is performed in close connection between ASU, DCA, and J.A. Woollam Co. in the developing of real time in-situ thickness control project. ASU has become a testbed in developing of ultra-stable manipulator for MBE chamber by DCA and for Woollam Co. for their developing of 44 wavelength ellipsometer in real time control. Researcher at ASU include Prof. G. N. Maracas, Dr. Chau-Hong Kuo, and Mr. Martin Boonzaayer. Tapani Levola from DCA and Blain Johs from Woollam Co. was also involved in the construction and testing of the working equipment and model for this project. The results and experience that we learned from this project can be used not only in MBE growth, but it can also be applied in the MOCVD chamber which is widely used in the industry for the thin film deposition. ARPA can transfer this technique from the university funded project to industry into various MOCVD chamber to grow thin film quantum device. The quality of the thick layer of SiO2 grown on various substrate, like glass or plastic, have been measured ex-situ by ellipsometry. This result has been used to monitor the quality of SiO2 thin film on plastic or glass. This report will mainly concentrated in the accomplishment at the last year of this contract.
- Atomic and Molecular Physics and Spectroscopy
- Inorganic Chemistry
- Organic Chemistry
- Particle Accelerators