Subwavelength-Structured Surfaces for Optical Interconnects.
Final rept. Feb 94-Aug 95,
CORNELL UNIV ITHACA NY SCHOOL OF APPLIED AND ENGINEERING PHYSICS
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The fabrication of sub-wavelength structures has been used to develop efficient diffractive optical elements with a single masketch step as well as optically absorptive areas. By the controlled removal of a substrate material in sub-wavelength units, the effective refractive index of the substrate material can be varied from the original index to that of air or other fill material. Diffractive elements can be fabricated by varying the substrate refractive index in a diffractive pattern. A linear grating and a spherical diffractive lens were fabricated in fused quartz for use at the 632.8mm wavelength. A technique for fabricating sub-micron structures in silicon was also developed. The micro-structures have reflectances of as low as 0.05 and less than 0.5 across the visible spectrum. These structures can be used as antireflection coatings in silicon-based optoelectronic systems.
- Electrooptical and Optoelectronic Devices