Design of Imaging Materials for use with Photogenerated Base. Radiation Induced Beta-Elimination to Yield Poly(4-Hydroxystyrene).
CORNELL UNIV ITHACA NY BAKER LAB
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The search for chemically amplified resist and imaging materials that are resistant to airborne contaminants has led us to explore new routes to resist imaging. The use of photogenerated base is particularly attractive since several stable photoprecursors of amines and other bases have been developed. We have now designed a novel family of polymers that undergo base catalyzed Beta-elimination to afford polyp-hydroxystyrene. Although the active units of the polymers are different, their basic design is analogous to that of the well known family of t-BOC resists 1 that operate on the basis of acid-catalyzed side chain deprotection. Several polymers and copolymers containing base labile pendant groups have been prepared. Their use as chemically amplified imaging and resist materials is described.
- Polymer Chemistry
- Radiation and Nuclear Chemistry
- Coatings, Colorants and Finishes
- Laminates and Composite Materials
- Printing and Graphic Arts