Microlithographic Mask Development (MMD).
LORAL FEDERAL SYSTEMS MANASSAS VA
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The contract period began with the establishment of manufacturing capability for prototype x ray mask builds by targeting both technical and manufacturing issues. By July of 1994, technical focus for x ray mask build was redefined, falling in line with optical lithography strategy. The Semiconductor Industry Association Lithography Roadmap recommended changing MMD emphasis to 0.25 and O.l8 microns generations rather than the original 0.35 and O.25 microns. Established goals were measured by following the progress of three product types EXPO, NIGHTHAWK and TALON. The image size target for prototype masks started at O.25 microns for EXPO and progressed to 0.18 microns for NIGHTHAWK. TALON, a O.25 microns critical dimension CD test mask, provides a large process window for MMD learning. Engineering teams were charged with solving some major problems during the contract period.
- Solid State Physics