Real-Time, Self-Directed MBE Flux Control Incorporating in Situ Ellipsometry. Phase 2.
Final rept. 1 Apr 93-30 Jun 95,
TECHNOLOGY ASSESSMENT AND TRANSFER INC ANNAPOLIS MD
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The purpose of this program was to develop a process control technology that would be generally applicable for advanced materials processing and to transfer that technology to end users in industry and government. The specific goal was to apply the control concepts to fabrication of electronic and optoelectronic devices by thin film deposition using molecular beam epitaxy MBE. MBE was chosen because it is the favored technique and yet suffers from long deposition times and relatively high device rejection rates. The key results of this effort are detailed in this report. They include the development of a data logger, PID temperature control module with feed forward temperature compensation development, data logger and control module testing at the Materials Directorate and the Laboratory for Physical Sciences LPS, along with future testing plans.
- Industrial Chemistry and Chemical Processing