Surface Modification by High Current Metal Ion Implantation.
CALIFORNIA UNIV BERKELEY LAWRENCE BERKELEY LAB
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This report summarizes the research and development that has been carried out at Lawrence Berkeley Laboratory on metal ion implantation for a number of applications. The technical objectives of the program were to investigate the surface modification of metals, ceramics, and other materials by energetic implantation of metal ions and by the deposition of metal plasma, and the interaction of these two processes when applied sequentially or simultaneously. Metal ion implantation was done with a vacuum arc ion source based implantation facility that was developed under prior AROONR funding, and the metal plasma deposition was done using vacuum arc plasma guns. Gaseous species could be added during the implantation and deposition processes as a means of incorporating non-metallic elements into the surface and thus forming films and modified zones implanted surfaces layers of compound materials such as oxides and nitrides. Several novel research topics were addressed, as well as one specific sizeable project involving the surface modification of long copper rails from an electromagnetic rail gun. MM
- Ceramics, Refractories and Glass
- Metallurgy and Metallography
- Solid State Physics