Fourier Synthesis Lithographic Machine for Large Panel Display Fabrication.
Final rept. 1 Aug 94-31 Jan 95,
PHYSICAL OPTICS CORP TORRANCE CA
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This report addresses the development of a substitute for conventional lithographic technologies used to fabricate flat panel displays. Conventional technology has several weaknesses an image field 50 mm x 50 mm, a need for expensive projection equipment and precision stepper machines with a positioning accuracy of -0.25 microns and depth of focus of -1 micron and the necessity to use complicated mask technologies which pollute the environment. Physical Optics Corporation POC is developing a new Fourier synthesis lithography technology which will provide a field size of 500 mm x 500 mm without optical distortion or aberration. During Phase I, POC completed an optimization procedure to find the exact harmonic exposure to create the highest edge gradient in a synthetic lithographic pattern. We produced a comprehensive computer model of photoresist multiple exposure, and confirmed it experimentally. We also experimentally confirmed our simulation of the lateral propagation of the development process in photoresist. We completely designed the proposed Fourier synthesis lithographic machine FSLM. We anticipate that development of this new technology will lead to the construction of a full scale FSLM. MM
- Electrooptical and Optoelectronic Devices
- Printing and Graphic Arts