Accession Number:

ADA291302

Title:

Nanocrystalline Processing and Interface Engineering of Si3N4-Based Ceramics.

Descriptive Note:

Progress rept. 1 Jul-30 Sep 94,

Corporate Author:

MASSACHUSETTS INST OF TECH CAMBRIDGE DEPT OF CHEMICAL ENGINEERING

Personal Author(s):

Report Date:

1994-09-30

Pagination or Media Count:

2.0

Abstract:

During the past three months, our efforts have been devoted to synthesizing nanocrystalline Si3N4 and Y2O3. For nanocrystalline Si3N4, a tubular reactor design has been adopted to produce nanoclusters by inert gas condensation in a forced flux flow. This reactor involves various features that allow us to control the synthesis conditions. Evaporation of Si takes place in a cruible located near one end of the reactor. A gas flow is established through the use of a booster pump to bring the nanoclusters generated quickly out of the hot growth zone to prevent particle agglomeration. The nanometer-sized particles are deposited on a liquid-nitrogen cooled flat plate at the other end of the reactor through thermophoresis. MM

Subject Categories:

  • Ceramics, Refractories and Glass
  • Crystallography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE