Accession Number:

ADA289742

Title:

Low Voltage Electron Beam Lithography,

Descriptive Note:

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Personal Author(s):

• Browning, R.

Report Date:

1994-08-01

Pagination or Media Count:

2.0

Abstract:

The software has been completed for Monte-Carlo simulation of scattering of low energy electrons from a line edge using the new low voltage scattering cross-sections developed under this contract. The software properly treats crossings of all surfaces. For example between the sidewall-gap-substrate. This includes re-entrant sidewalls with an undercut. KAR

Descriptors:

• *COMPUTER PROGRAMS
• *COMPUTERIZED SIMULATION
• *LITHOGRAPHY
• *ELECTRON BEAMS
• SCATTERING
• EDGES
• MONTE CARLO METHOD
• SURFACES
• LOW ENERGY
• CROSS SECTIONS

Subject Categories:

• Manufacturing and Industrial Engineering and Control of Production Systems
• Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE