High-Density Plasma Source for Large-Area Chemical Vapor Deposition of Diamond Films.
Monthly rept. 1 Nov-30 Nov 94,
SCIENCE RESEARCH LAB INC SOMERVILLE MA
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During this program Science Research Laboratory SRL and the Plasma Processing Group in the Department of Chemical Engineering at MIT are developing a large-area, directed plasmaatomic beam source for diamond deposition. The plasma source is based on an inductively-driven plasma accelerator that efficiently produces a high density 1014-1017 cm-3 plasma over an area of 0.1-1 m2. The goal of this effort is to experimentally demonstrate the technical feasibility of employing the plasma source for high-throughput diamond deposition, through characterization of plasma parameters and preliminary diamond deposition experiments. A reactor design study will also be completed during Phase 1, leading to an engineering design of a large-area plasma reactor for Phase H implementation. The period of performance is from 30 September 1994 to 31 March 1995.
- Industrial Chemistry and Chemical Processing
- Plasma Physics and Magnetohydrodynamics