Ion Scattering and Deposition: The Role of Energetic Particles in Thin Film Growth
Annual rept. 1 Sep 1993-31 Aug 1994
CORNELL UNIV ITHACA NY
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Energetic ions or neutrals in the hyperthermal energy range have been used in a number of thin film growth applications e.g., sputtering and plasma deposition techniques, direct ion beam and ion-assisted deposition, etc. . These involve both direct deposition of the film species with an ion beam, and deposition by some other method during simultaneous ion bombardment. Experiments and simulations have shown that energetic ions can lower the substrate temperature required to achieve crystallinity, can change growth morphologies, and influence structure and crystallographic orientation in the film. In many cases, the mechanisms responsible for ion-induced modification of growth are not understood at the atomic level. We have initiated both scattering and scanning tunneling microscopy STM studies to probe these mechanisms.
- Atomic and Molecular Physics and Spectroscopy
- Particle Accelerators
- Solid State Physics