Materials Processing and Manufacturing Technologies for Diamond Substrates Multichip Modules
APPLIED SCIENCE AND TECHNOLOGY INC WOBURN MA
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The previous quarter saw attainment of the target 1ghr diamond deposition at 75kW, as well as full power continuous operation of the AX6600 system. In this quarter we have focused on process chemistry at full power, exploring the operating range of the AX6600 and process chemistry variables. Specific process conditions we have explored include deposition rates from 300 mghr to over 900 mghr, operation from 50 to over 75 kW, deposition on areas from 6 diameter to 12 diameter, deposition on a variety of substrate materials and techniques for intact release of the diamond at the end of the deposition step, deposition of non-uniform films for stressflatness control.
- Inorganic Chemistry
- Electrical and Electronic Equipment
- Laminates and Composite Materials
- Manufacturing and Industrial Engineering and Control of Production Systems