Accession Number:

ADA285411

Title:

Modeling, Simulation and Engineering Scale-up Procedures for Design of CVD Reactors

Descriptive Note:

Final rept.

Corporate Author:

STATE UNIV OF NEW YORK AT BUFFALO LAB FOR CERAMIC AND REACTION ENGINEERING

Personal Author(s):

Report Date:

1989-01-01

Pagination or Media Count:

6.0

Abstract:

The research program was aimed towards the development of generic processes for growing thick films deposited by CVD techniques. The application of thick-film technology includes the manufacturing of optical windows and ceramic plates, fabrication of optical domes and refractory crucibles, production of refractory metal tubes, ceramic fibers, etc. The objective of this research was to understand the complex phenomena which could occur in a CVD system, including problems of reactive fluid flow, instability of the deposition process at the interphase fluid-solid, stability of the nucleation process on the solid surface, and generation and development of stresses due to thermal gradients and growth-induced mechanisms. New ways of increasing the rate of deposition were also contemplated.

Subject Categories:

  • Industrial Chemistry and Chemical Processing
  • Coatings, Colorants and Finishes

Distribution Statement:

APPROVED FOR PUBLIC RELEASE