Accession Number:

ADA281724

Title:

Development of Nanostructure Fabrication Technology and New Electron-Quantum Wave Devices

Descriptive Note:

Final rept. 1 Apr 1990-31 Mar 1993

Corporate Author:

MINNESOTA UNIV MINNEAPOLIS DEPT OF ELECTRICAL ENGINEERING

Personal Author(s):

• Chou, Stephen Y.
• Fischer, Paul B.
• Fischer, P. B.
• Wang, Yun
• Liu, Yue
• Hsiang, Thomas Y.
• Alexandrou, Sotiris
• Sobolewski, R.
• Liu, Mark Y.
• Khalil, W.
• Wang, Chia-Chi

Report Date:

1994-02-15

Pagination or Media Count:

21.0

Abstract:

Under the three-year grant, we have investigated and developed various nanofabrication technologies including construction of an ultra-high resolution electron beam lithography system, sub-20 nm electron beam lithography techniques, etching of sub-40 nm silicon pillars and ridges b fabricated various nanoscale transistors including a number of new device structures c studied quantum effects and single electron effects d designed, fabricated, and investigated ultra-fast metal-semiconductor-metal photodetectors with the record speeds on various of semiconductors, including low-temperature GaAs with 510 GHz bandwidth, bulk GaAs with 300 GHz, and bulk Si with 75 GHz.

Descriptors:

• *STRUCTURES
• *FABRICATION
• *LITHOGRAPHY
• *ELECTRON BEAMS
• *QUANTUM ELECTRONICS
• *TRANSISTORS
• VELOCITY
• METALS
• GALLIUM ARSENIDES
• SEMICONDUCTOR DEVICES
• HIGH RESOLUTION
• ETCHING
• SILICON
• BANDWIDTH
• PHOTODETECTORS
• WAVES

Subject Categories:

• Electrical and Electronic Equipment
• Printing and Graphic Arts
• Particle Accelerators
• Quantum Theory and Relativity

Distribution Statement:

APPROVED FOR PUBLIC RELEASE