Low Voltage Electron Beam Lithography
Monthly rept. for Apr 1994
STANFORD UNIV CA CENTER FOR INTEGRATED SYSTEMS
Pagination or Media Count:
The contract has three parts covering aspects of high precision electron beam lithography. 1 Comprehensive computer modeling of the electron beam tool. 2 Experimental determination of the properties of sources, columns, and targets, and 3 The use of silicon single crystals as straightness and orthogonality standards using orientation dependent etching techniques.
- Printing and Graphic Arts
- Electricity and Magnetism
- Particle Accelerators