Accession Number:

ADA281046

Title:

Low Voltage Electron Beam Lithography

Descriptive Note:

Monthly rept. for Apr 1994

Corporate Author:

STANFORD UNIV CA CENTER FOR INTEGRATED SYSTEMS

Personal Author(s):

• Browning, R.
• Pease, R. F.

Report Date:

1994-04-01

Pagination or Media Count:

2.0

Abstract:

The contract has three parts covering aspects of high precision electron beam lithography. 1 Comprehensive computer modeling of the electron beam tool. 2 Experimental determination of the properties of sources, columns, and targets, and 3 The use of silicon single crystals as straightness and orthogonality standards using orientation dependent etching techniques.

Descriptors:

• *LITHOGRAPHY
• *ELECTRON BEAMS
• *LOW VOLTAGE
• MODELS
• COMPUTERS
• PRECISION
• ORTHOGONALITY
• SILICON
• SINGLE CRYSTALS
• ETCHING

Subject Categories:

• Printing and Graphic Arts
• Electricity and Magnetism
• Particle Accelerators

Distribution Statement:

APPROVED FOR PUBLIC RELEASE