Accession Number:
ADA281046
Title:
Low Voltage Electron Beam Lithography
Descriptive Note:
Monthly rept. for Apr 1994
Corporate Author:
STANFORD UNIV CA CENTER FOR INTEGRATED SYSTEMS
Personal Author(s):
Report Date:
1994-04-01
Pagination or Media Count:
2.0
Abstract:
The contract has three parts covering aspects of high precision electron beam lithography. 1 Comprehensive computer modeling of the electron beam tool. 2 Experimental determination of the properties of sources, columns, and targets, and 3 The use of silicon single crystals as straightness and orthogonality standards using orientation dependent etching techniques.
Descriptors:
Subject Categories:
- Printing and Graphic Arts
- Electricity and Magnetism
- Particle Accelerators