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Chromium/Molybdenum Alloy Plating. Part 1: The Electrodeposition of Low Contraction Chromium/Molybdenum Alloys Using Unipolar (On/Off) Pulse Plating
ARMY ARMAMENT RESEARCH DEVELOPMENT AND ENGINEERING CENTER WATERVLIET NY BENET LABS
Pagination or Media Count:
The microstructure and mechanical properties of a pulse-plated low contraction LC chromiummolybdenum CrMo alloy deposit were evaluated and compared to both pulse-plated LC chromium and direct dc-plated LC chromium. Molybdenum concentrations as high as approximately 2.4 percent were obtained at a pulsing frequency of 5 Hz 100 ms on-time100 ms off-time. This represents nearly a 300 percent increase over the percent molybdenum obtained in a dc- plated LC CrMo alloy deposit However, pulse-plated LC CrMo deposits were generally poor in quality with deposits that were frequently cracked and nodular in appearance. Hardness values as high as 900 KHN 50 gm load were obtained for the pulse-plated LC CrMo alloy. deposit. This hardness represents an 18 percent increase over the maximum reported hardness obtained in a dc-plated LC chromium deposit. The maximum cathode current efficiency CCE obtained while pulse plating an LC CrMo alloy was 7.3 percent. This is nearly 52 percent less than the reported CCE obtained when dc plating LC chromium. ChromiumMolybdenum Alloy, Aqueous, Pulse, Electrodeposition
APPROVED FOR PUBLIC RELEASE