Accession Number:

ADA277431

Title:

Electron Cyclotron Resonance Plasma Oxidation Studies of InP

Descriptive Note:

Technical rept.

Corporate Author:

NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1994-03-15

Pagination or Media Count:

29.0

Abstract:

Electron cyclotron resonance plasma oxidation of InP was studied using both spectroscopic and single wavelength ellipsometry employed during the oxidation process. A two layer oxide was observed with the outer layer being In rich and the inner layer P rich as-confirmed from x-ray photoelectron spectroscopy and etch rate studies. Optical models and oxidation kinetics are analyzed. From positive substrate bias effects on oxidation rates, negative ion oxidant species were identified as dominant and oxide etching was observed at negative bias. Electron, Cyclotron, InP, Ellipsometry.

Subject Categories:

  • Physical Chemistry
  • Atomic and Molecular Physics and Spectroscopy
  • Particle Accelerators
  • Plasma Physics and Magnetohydrodynamics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE