Electron Cyclotron Resonance Plasma Oxidation Studies of InP
NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY
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Electron cyclotron resonance plasma oxidation of InP was studied using both spectroscopic and single wavelength ellipsometry employed during the oxidation process. A two layer oxide was observed with the outer layer being In rich and the inner layer P rich as-confirmed from x-ray photoelectron spectroscopy and etch rate studies. Optical models and oxidation kinetics are analyzed. From positive substrate bias effects on oxidation rates, negative ion oxidant species were identified as dominant and oxide etching was observed at negative bias. Electron, Cyclotron, InP, Ellipsometry.
- Physical Chemistry
- Atomic and Molecular Physics and Spectroscopy
- Particle Accelerators
- Plasma Physics and Magnetohydrodynamics