Accession Number:

ADA277368

Title:

Final Report for Grant AFOSR-91-0123 (Washington University)

Descriptive Note:

Final rept. 1 Dec 1990-30 Nov 1993

Corporate Author:

WASHINGTON UNIV SEATTLE DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1994-01-31

Pagination or Media Count:

6.0

Abstract:

Modulated molecular beam studies have been carried out in combination with scanning tunneling microscopy to determine basic mechanisms in the reactions of atomic and molecular oxygen and chlorine with Si111 and Si100. The effect of vibrational excitation was also studied for Cl2. We have uncovered a number of reaction mechanisms and determined activation energies and preexponential factors which had not been known previously. Quantitative reaction probabilities for atoms and molecules were determined. They differ from a 10exp3-10exp5 higher reactivity for 0 over 02 to a factor of 2-10 for Cl over Cl2. Inhomogeneous decomposition of ultrathin oxides on Si100 was studied at atomic resolution using STM. It was found that defects at step sites play no role in void nucleation. Silicon, Oxygen, Chlorine, Etching, Oxidation.

Subject Categories:

  • Inorganic Chemistry
  • Atomic and Molecular Physics and Spectroscopy
  • Optics
  • Particle Accelerators

Distribution Statement:

APPROVED FOR PUBLIC RELEASE