Accession Number:

ADA277317

Title:

Electron Cyclotron Resonance Plasma and Thermal Oxidation Mechanisms of Germanium

Descriptive Note:

Technical rept.

Corporate Author:

NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1994-03-15

Pagination or Media Count:

24.0

Abstract:

The electron cyclotron resonance ECR plasma oxidation and thermal oxidation mechanisms for germanium were investigated using in-situ spectroscopic and single wavelength ellipsometry. ECR plasma oxidation was performed at substrate temperatures of 80 deg to 400 deg C while thermal oxidations were performed between 400 deg to 600 deg C. Optical modeling shows that there is an interface between the oxide film and the substrate that is composed of germanium oxide and amorphous germanium. The nature of the interface and factors controlling its thickness were studied for different oxidation conditions and with various characterization methods X-ray photoelectron spectroscopy XPS to confirm the optical model, capacitance-voltage C-V measurements to measure electronic properties, and Fourier transform infrared spectroscopy FTIR to deter-mine the molecular structure. Electron, Cyclotron resonance, Thermal oxidations

Subject Categories:

  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE