Accession Number:

ADA276382

Title:

Process Parameter-Growth Environment-Film Property Relationships for Reactive Sputter Deposited Metal (V, Nb, Zr, Y, Au) Oxide, Nitride, and Oxynitride Films

Descriptive Note:

Final rept. 1 Jan 1989-30 Jun 1993

Corporate Author:

WISCONSIN UNIV-MILWAUKEE DEPT OF MATERIALS ENGINEERING

Personal Author(s):

Report Date:

1993-09-30

Pagination or Media Count:

122.0

Abstract:

The research developed process parameter-growth environment-film property relations phase maps for model sputter-deposited transition metal oxides, nitrides, and oxynitrides grown by reactive sputter deposition at low temperature. Optical emission spectrometry was used for plasma diagnostics. The results summarized here include the role of sputtered metal-oxygen molecular flux in oxide film growth structural differences in highest valence oxides including conditions for amorphous growth and using fundamental optical absorption edge features to probe short range structural disorder. Eight appendices containing sixteen journal articles are included.

Subject Categories:

  • Physical Chemistry
  • Electrical and Electronic Equipment
  • Metallurgy and Metallography
  • Fabrication Metallurgy
  • Crystallography
  • Atomic and Molecular Physics and Spectroscopy
  • Optics
  • Plasma Physics and Magnetohydrodynamics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE