Accession Number:

ADA273626

Title:

Dipolar Relaxation in a Second-Order Nonlinear Optical Interpenetrating Polymer Network

Descriptive Note:

Technical rept.,

Corporate Author:

MASSACHUSETTS UNIV LOWELL DEPT OF CHEMISTRY

Report Date:

1993-11-29

Pagination or Media Count:

17.0

Abstract:

The nature of the relaxation process of the poled order in an interpenetrating polymer network IPN system is found to be fundamentally different from that of a guesthost system. The IPN Tg 176 deg C consists of a nonlinear optical NLO active epoxy-based polymer network and an NLO active phenoxy-silicon polymer network. The decay behavior of the second-order nonlinearity of this IPN was investigated in the range from 110 to 170 deg C. The stability of this IPN is superior to those of classic guesthost polymers as indicated by longer relaxation times at temperatures from 110 to 130 deg C. The relaxation process of the IPN system follows Arrhenius type behavior at temperatures ranging from 140 to 170 deg C. The IPN system provides a new approach to processing for stabilization of the second-order nonlinear optical properties. Relaxation, Interpenetrating polymer network, Nonlinear optical, Arrhenius

Subject Categories:

  • Polymer Chemistry
  • Electricity and Magnetism
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE