Accession Number:

ADA273394

Title:

Ferroelectric Thin Films III, Symposium Held in San Francisco, California on April 13 - 16, 1993. Materials Research Society Symposium Proceedings, Volume 310

Descriptive Note:

Corporate Author:

MATERIALS RESEARCH SOCIETY PITTSBURGH PA

Report Date:

1993-04-16

Pagination or Media Count:

491.0

Abstract:

This symposium showcased the advancement in processing technology and basic scientific understanding of ferroelectric thin films. The conference highlighted the use of novel materials science analysis techniques to characterize ferroelectric thin film materials and devices and to relate the nanoscale features and responses detected by these techniques to ferroelectric, electrooptic and piezoelectric properties. Examples of newer material analysis techniques included atomic force microscopy, electron spin resonance, high resolution transmission electron microscopy, combined Rutherford backscattering- nuclear reaction analysis and the use of optical interferometry to provide a three dimensional representation of field induced displacement.

Subject Categories:

  • Coatings, Colorants and Finishes
  • Electricity and Magnetism
  • Optics
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE