Accession Number:

ADA273254

Title:

X-Ray Diffraction Analysis of Electrodeposited Beta-Tantalum

Descriptive Note:

Final rept.,

Corporate Author:

ARMY ARMAMENT RESEARCH DEVELOPMENT AND ENGINEERING CENTER WATERVLIET NY BENET LABS

Personal Author(s):

Report Date:

1993-09-01

Pagination or Media Count:

21.0

Abstract:

An adherent coating of beta-tantalum beta-tantalum has been electrodeposited on copper from a FLINAK molten salt electrolyte. Electrolyte temperatures ranged from 700 to 800 deg C using pulse current electrolysis at current densities higher than 100 mAsq cm. The beta-tantalum was deposited to a thickness of over 3 mils. The x ray diffraction pattern of the electrodeposited beta-tantalum was indexed using a Hull-Davey chart. The coatings were found to have a highly preferred orientation, and the tetragonal structure was found to have the lattice parameters of a 6.419 A and c 3.051 A. Molten salt, Electrodeposition, Beta-Tantalum, Tantalum, X-Ray diffraction

Subject Categories:

  • Physical Chemistry
  • Coatings, Colorants and Finishes
  • Fabrication Metallurgy
  • Nuclear Physics and Elementary Particle Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE