Accession Number:

ADA265998

Title:

A Novel Photosensitive Polyimide Resist Consisting of a Soluble Polyimide and a Bis(perfluorophenyl Azide) as a Cross-Linker

Descriptive Note:

Technical rept. Mar 92-Jun 93,

Corporate Author:

OREGON UNIV EUGENE DEPT OF CHEMISTRY

Report Date:

1993-06-10

Pagination or Media Count:

15.0

Abstract:

A photosensitive polyimide resist that consists of a soluble polyimide 5 and bisPFPA 6 as a cross-linker has been formulated. Polyimide 5 containing 11 wt of bisPFPA has a deep-UV sensitivity of 30-35 mJ sq cm while polyimide 5 itself has a deep-UV sensitivity of 350-400 mJ sq cm. Under our present conditions, features of about 0.5 um could be resolved with this resist system.... Polymers, Deep-UV negative resist

Subject Categories:

  • Organic Chemistry
  • Polymer Chemistry
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE