Accession Number:

ADA265358

Title:

Low Voltage Electron Beam Lithography

Descriptive Note:

Monthly rept.

Corporate Author:

STANFORD UNIV CA CENTER FOR INTEGRATED SYSTEMS

Personal Author(s):

Report Date:

1993-02-01

Pagination or Media Count:

10.0

Abstract:

The contract has three parts covering aspects of high precision electron beam lithography. 1 Comprehensive computer modeling of the electron beam tool. 2 Experimental determination of the properties of sources, columns, and targets, and 3 The use of silicon single crystals as straightness and orthogonality standards using orientation dependent etching techniques

Subject Categories:

  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE