Applications of Spectroscopic Ellipsometry to Microelectronics
NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY
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Ellipsometry has been applied to problems in the microelectronics industry from the beginning in the 1960s. More recently spectroscopic ellipsometry has been introduced. In-situ during process ellipsometry offers great promise for monitoring and control of a wide variety of microelectronics processes. This review covers some applications in silicon technology such as oxidation, chemical vapor deposition, etching, interfaces, and new processing techniques such as plasma, ion beam and rapid thermal, in an effort to demonstrate the kinds of crucial microelectronics information and processes that modern ellipsometry can access. The conclusion is that single wavelength ellipsometry along is not sufficient spectroscopic ellipsometry is required to establish the optimum ellipsometry measurement conditions. The future of ellipsometry in microelectronics is assessed.
- Electrical and Electronic Equipment
- Test Facilities, Equipment and Methods