Real Time Self-Directed MBE Flux Control Incorporation In Situ Ellipsometry. Phase 1
Final rept. 27 May-27 Nov 1992
TECHNOLOGY ASSESSMENT AND TRANSFER INC ANNAPOLIS MD
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The objective of this program was to achieve real-time control of thin film properties during deposition by the molecular beam epitaxy MBE method. Satisfying this objective required development of techniques that would permit rapid and accurate control of the beam fluxes of the chemical constituents of the growing film. This objective of precise flux control was to be achieved by 1 using self-directed temperature and shutter control, and 2 employing ellipsometry for direct monitoring and feedback over alloy composition and film thickness.
- Properties of Metals and Alloys