Low Voltage Electron Beam Lithography.
Monthly rept. for Oct 1992
STANFORD UNIV CA CENTER FOR INTEGRATED SYSTEMS
Pagination or Media Count:
The contract has three parts covering aspects of high precision electron beam lithography 1 Comprehensive computer modelling of the electron beam tool 2 Experimental determination of the properties of sources, columns, and targets and 3 The use of silicon single crystals as straightness and orthogonality standards using orientation dependent etching techniques.
- Printing and Graphic Arts
- Particle Accelerators