Accession Number:

ADA263360

Title:

Low Voltage Electron Beam Lithography.

Descriptive Note:

Monthly rept. for Oct 1992

Corporate Author:

STANFORD UNIV CA CENTER FOR INTEGRATED SYSTEMS

Personal Author(s):

Report Date:

1992-10-01

Pagination or Media Count:

5.0

Abstract:

The contract has three parts covering aspects of high precision electron beam lithography 1 Comprehensive computer modelling of the electron beam tool 2 Experimental determination of the properties of sources, columns, and targets and 3 The use of silicon single crystals as straightness and orthogonality standards using orientation dependent etching techniques.

Subject Categories:

  • Printing and Graphic Arts
  • Particle Accelerators

Distribution Statement:

APPROVED FOR PUBLIC RELEASE